The JEOL JSM-6400F field-emission scanning electron microscope (FESEM) is a high resolution cold field emission SEM.

This instrument generally requires that samples either be conductive or coated with a conductor. ( It is possible to image insulators at the charge balance point, but this requires considerable user skill.)  Images are collected with an Everhart-Thornley secondary electron detector.

The JEOL JSM-6400F FESEM is equipped with an Everhard-Thornley secondary electron detector and a GW specimen current meter.  Electrical feedthroughs are also mounted on the chamber to allow powering active electrical devices or observing electron beam induced current (EBIC).  Using electrical feedthroughs, various researchers have interfaced testing equipment inside the FESEM including a nanomanipulator and a tensile testing cell.  A 4Pi Universal Spectral Engine (electronics set) allows for digital data collection from all of the detectors.

Equipment Specifications

  • Everhart-Thornley secondary electron detector
  • GW Specimen current meter
  • Digital imaging of secondary electron images (topographical contrast)
  • Digital imaging of specimen current
  • EBIC (assumes a means of electrically connecting to the sample!)
Accelerating Voltage
  • 0.5 – 30 kV
  • 10X – 500,000X  (39mm and <10mm working distances required respectively)
Resolution (SE)
  • 15 Angsroms @ 30kV and 8mm working distance
Working Distance
  • 3-53 mm focusable (<8mm not recommended due to detector geometry considerations)
Specimen Stage
  • Eucentric tilt -5° to +60º
  • Rotate 360º
  • x = 100 mm
  • y = 110 mm
  • z = 34 mm, stage based working distance adjustable from 5mm – 39mm
Specimen Considerations
  • Conductors and Semiconductors are directly observable.  Insulators generally require a thin coating of conductive material.  Wet and/or oily samples must be dried and free of volatile compounds before insertion into the instrument chamber.
  • Specimens can be up to 150mm in diameter and up to 20mm thick
    • Only the center 100x110mm area can be observed on large specimens


JSM6400F illustrated quickreference4

Instrument Photograph and Examples



needle pushing cantilever1

Needle from a nanomanipulator pushing a cantilever beam. Sample and image courtesy Yong Zhou.


Electrospun nanofibers observed at 10kX. Sample courtesy Orlando Rojas.

21 2A 03

Cross-section of a wood sample grown to study the decay of wood by fungi. Sample courtesy Ilona Peszlen.

doe 2 trenches med

Trenches etched in Si using the Bosch method. Sample courtesy Steve Shannon.


Si particles integrated into electrospun nanofibers. Applications for particles integrated into electrospun nanofiber mats includer advanced filtration and battery technology.
From the work of Xiangwu Zhang.


Micromasking during an etch process produces collimate whiskers commonly referred to as “black silicon.” Originally considered a menace and avoided at all costs, the nanowhiskers are now playing a critical role in energy devices.
From the work of Steve Shannon.