The computer simulation software “jems“, developed by Prof. Pierre Stadelmann at the Swiss Federal Institute of Technology, is available for all TEM users. The software simulates many aspects of electron diffraction phenomena related to the electron microscopy of compounds.  It allows a user to model crystal structure, dynamic diffraction patterns, convergent-beam diffraction patterns, transfer functions, and high resolution images based on the multi-slice and the Bloch wave methods.

Effect of thickness on Convergent Beam Electron Diffraction (CBED) of GaAs in [111] direction, 40 nm (left), 110 nm (middle), and 205 nm (right).

Effect of thickness on Convergent Beam Electron Diffraction (CBED) of GaAs in [111] direction, 40 nm (left), 110 nm (middle), and 205 nm (right).

Staff and Steering Committee Access Policy Training Plan Laboratory Guidelines